发明名称 GRINDING DEVICE FOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a grinding device for substrates capable of continuously supplying a very small amount of water or solution instead of droplets of water to the grinding surface of a grinding wheel. SOLUTION: In a grinding device for substrates, which grinds the surface to be ground of the substrate 4 flat and mirror-finished by sliding the grinding wheel 15 on the substrate 4, a nozzle 10 for supplying water or solution to the grinding surface of the grinding wheel 15 or the surface to be ground of the substrate, is provided. The tip position of the nozzle 10 is arranged close to the grinding surface of the grinding wheel to a degree that no liquid-drops cannot be formed between the tip of the nozzle 10 and the grinding surface of the grinding wheel 15 or the surface to be ground of the substrate 4.
申请公布号 JPH11277411(A) 申请公布日期 1999.10.12
申请号 JP19980096883 申请日期 1998.03.25
申请人 EBARA CORP 发明人 HIROKAWA KAZUTO;HIYAMA HIROKUNI;WADA TAKETAKA;MATSUO NAONORI
分类号 B24B37/00 主分类号 B24B37/00
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