SUBSTRAT COMPLIANT EN PARTICULIER POUR UN DEPOT PAR HETERO-EPITAXIE

摘要

The invention concerns a compliant substrate (5) comprising a support (1) and at least a thin layer (4), formed at the support surface and designed to receive, integrally, a structure causing stresses. The support (1) and the thin layer (4) are linked to each other by linking means (3) such that the stresses caused by said structure are wholly or partially absorbed by the thin layer (4) and/or by the linking means (3) which comprise at least a linking zone selected among the following linking zones: a layer of microcavities and/or a bonding interface whereof the bonding energy is controlled to enable absorption of said stresses.