| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition, high in resolution and good in process stability, and a manufacturing method for a relief pattern, exhibiting excellent heat resistance, resolution, and chemical resistance, and giving a good shape. SOLUTION: This photosensitive composition contains (A) a compound having addition-polymerizing radicals or a polymer having addition-polymerizing radicals, (B)γ-butyrolactone, (C) a pigment compound having absorption at 450 nm to 600 nm, and (D) a photopolymerization initiator, and, in this manufacturing method for a relief pattern, a coating film of this photosensitive composition is irradiated with active light from above a mask having a pattern drawn thereon and non-irradiated parts are removed by developing them. |
