MANUFACTURE OF MINUTE-HOLE FILM USING ELECTRON BEAM

摘要

PROBLEM TO BE SOLVED: To form a large number of holes by a method wherein an electron beam narrowed down to the size of a diameter 0.2 nm-200μm is cast on the surface of a film and then chemical etching is applied to the surface. SOLUTION: In a method for manufacturing a minute-hole film wherein a large number of holes are formed by casting an electron beam on the surface of the film and then by applying thereto chemical etching by an alkali solution, an acid solution, an oxidizing agent, etc., the electron beam having the energy of 20-2000 keV and a total current value of 10μA-1 mA is narrowed down to the size of a diameter 0.2 nm 200μm and cast.