发明名称 TREATING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide a coater which will not cause a defective coating film such that the resist film thickness becomes nonuniform. SOLUTION: A chuck 80 for holding a glass substrate during rotating has a hold face 80a, having suction hoes 81 at four apexes of a square concentric with the hold face 80a to disperse the suction force exerted portion to the four regions on the glass substrate, this permitting the diameter of each suction hole 81 to be reduced and resulting in the suppression of the temp. drop per suction hole 81 due to the effects of the suction force. This avoids partial thickening of the resist film only at the location of the suction hole 81 and avoids forming a defective coating film having a nonuniform thickness.</p>
申请公布号 JPH11145263(A) 申请公布日期 1999.05.28
申请号 JP19970305692 申请日期 1997.11.07
申请人 TOKYO ELECTRON LTD 发明人 SAKAI MITSUHIRO;OMORI TSUTAE;MURATA KAZUHIKO
分类号 H01L21/683;H01L21/027;H01L21/304;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
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