发明名称 EPITAXIAL WAFER AND COMPOUND SEMICONDUCTOR DEVICE
摘要 <p>An epitaxial wafer having a good surface and having a buffer layer of a resistance higher than that of the prior art. The epitaxial wafer has at least a buffer layer (42) and an active layer (43) successively formed on a GaAs substrate (41), wherein the buffer layer (42) has a multilayer structure of a non-doped AlYGa1-YAs (0.005≤Y≤0.05) layer (42a) and a non-doped AlXGa1-XAs (0.10≤X≤0.35) layer (42b). The non-doped AlYGa1-YAs (0.005≤Y≤0.05) layer (42a) is in contact with the GaAs substrate (41).</p>
申请公布号 WO1999026297(P1) 申请公布日期 1999.05.27
申请号 JP1998005136 申请日期 1998.11.16
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