Case for photomask

摘要

The present invention relates to a case for a photomask (10) prevent generation of dust, which attaches to and stain a photomask or the photomask pellicle (11). In a case for a photomask comprising a case main unit(1) with an upper opening for accommodating the photomask (10) and a lid (2) for the opening of the case main unit (1), cushion materials (41, 42) are provided on inner bottom of the case main unit (1) and on inner ceiling of the lid (2). The photomask (10) is elastically squeezed between the cushion materials when accommodated. Thus, shaking and rattling during transportation are prevented to minimize the generation of dust. As the cushion material (41, 42), a rubber material having smooth surface on one side and coarse surface on the other side is used.