摘要 |
PCT No. PCT/DE96/00076 Sec. 371 Date Sep. 2, 1997 Sec. 102(e) Date Sep. 2, 1997 PCT Filed Jan. 19, 1996 PCT Pub. No. WO96/23173 PCT Pub. Date Aug. 1, 1996An apparatus for purifying waste gases, particularly waste gases from CVD (chemical vapor deposition), plasma etching or similar processes, with at least one combustion space, which is in a vertical arrangement within an outer pipe and is limited at the top by an umbrella-like cover, and an internally or externally mixing burner, the combustion gas nozzles of which protrude into the combustion space, combustion gas, oxygen or air and waste gas being supplied to the burner, as well as to means for supplying and discharging oxidizing agents and/or absorbents to a scrubbing space above the combustion space. By means of the invention, an apparatus is to be provided for purifying waste gases, which can be manufactured cost-effectively and by means of which the disadvantages of the state of the art are avoided. The invention is characterized in that the burner (12) is fastened centrally in the cover (5), the burner (12) has combustion gas nozzles (13) and at least one waste gas nozzle (14), which are directed vertically downwards into the combustion space (6), and that the reaction products, formed during the combustion process, are passed along the inside of the outer pipe (1) into the scrubbing space (7).
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申请人 |
CENTROTHERM ELEKTRISCHE ANLAGEN GMBH & CO. |
发明人 |
HARTUNG, ROLF;AUTENRIETH, HANS;KROEDEL, GUNTER;FABIAN, LUTZ;RESCH, DIETMAR |