BAXSR1-XTI03-Y TARGET MATERIAL FOR SPUTTERING

摘要

PROBLEM TO BE SOLVED: To obtain a target material for sputtering composed of a sintered compact, represented by Bax Sr1-x TiO3-y enabling the production of a thin film hardly containing particle defects and simultaneously improving the mechanical strength. SOLUTION: This target material for sputtering has >=97% relative density of a sintered compact and <=3 μm average crystal grain diameter of the sintered compact in the target material for the sputtering composed of the sintered compact of a perovskite type compound oxide represented by the formula Bax Sr1-x TiO3-y [0<=(x)<1 and 0<=(y)<0.5]. The target material for the sputtering is produced by baking a synthetic powder of the Bax Sr1-x TiO3-y having <=1 μm average grain diameter according to a hot-pressing method, a method for using the hot-pressing method and a hot isostatic pressing(HIP) in combination and a method for using a sintering method under atmospheric pressure and the HIP in combination.