发明名称 ELECTRODE PLATE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide an electrode plate and manufacture thereof which can drill precisely in a short time and at a low cost and by which the surface roughness of the inner wall of a small diameter hole becomes flatter and the generation of a particle and contamination is scarcely occurred. SOLUTION: In the manufacturing method of an electrode plate having lots of small diameter holes for a reaction gas rectifying, when the small diameter hole of the electrode plate is drilled by a diamond drill processing or ultrasonic processing, it is drilled while pouring a grain slurry and the surface roughness Ra of the inner wall of the small diameter hole is finished to the range of 0.01-5 μm. In the electrode plate having lots of small diameter holes for reaction gas rectifying, the surface roughness Ra of the inner wall of the small diameter hole of the electrode plate is the range of 0.01-5 μm.
申请公布号 JPH11104950(A) 申请公布日期 1999.04.20
申请号 JP19970286265 申请日期 1997.10.03
申请人 SHIN ETSU CHEM CO LTD 发明人 GOTO KEIICHI;KOBAYASHI TOSHIMI;KAWAI MAKOTO
分类号 B24B37/00;H01L21/205;H01L21/302;H01L21/3065 主分类号 B24B37/00
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