| 摘要 |
PROBLEM TO BE SOLVED: To rapidly reduce the pressure in a load rock chamber, therefore, to speedily pass through the material to be treated and to improve the producing efficiency. SOLUTION: This vacuum treating device has a sputtering chamber for executing the treatment of a disk 2, a load rock chamber for executing the loading and unloading of the disk 2 to a sputtering chamber and an upper cover 15 closing the load rock chamber 4. In this case, the main body 1 of a device composing a part of the load rock chamber 4 is provided with air passage 17 and 18 communicated with a load rock chamber 15, and at least either the main body 1 of the device in which the air passages 17 and 18 have been formed or the upper cover 15 is provided with an accessory chamber 19 temporarily storing air from the air passages 17 and 18. |
