发明名称 Mirror for high-intensity ultraviolet light beam
摘要 A mirror for, e.g, an excimer laser is disclosed having high reflectance for a broad band of wavelengths in the ultraviolet range exhibiting excellent adhesion and "laser durability." The mirror comprises a substrate formed from glass or a glass-like material, a dielectric film, and a metallic film, such as aluminum foil, positioned between the dielectric film and the substrate. The dielectric film includes alternating layers of high- and low-refractive index material. These alternating layers reduce the amount of incident light reaching the metallic film so that any damage to the metallic film caused by light is reduced, thereby increasing the laser durability of the mirror. The laser durability is also increased because the durability of the laminated dielectric film is generally superior to that of the metallic film used in prior-art metallic reflector mirrors.
申请公布号 US5850309(A) 申请公布日期 1998.12.15
申请号 US19970828220 申请日期 1997.03.27
申请人 NIKON CORPORATION 发明人 SHIRAI, TAKESHI;ABOSHI, JUNJI
分类号 G02B5/08;(IPC1-7):G02B5/28;G02B1/00;H01S3/08;F21V9/06 主分类号 G02B5/08
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