| 摘要 |
PROBLEM TO BE SOLVED: To pass a substrate to an aligner in a specific position relationship even if the exposure device and the positioning part of a wafer loader system are displaced relatively when carrying the substrate such as a wafer from the wafer loader system to the aligner. SOLUTION: After the position and rotation angle of a wafer W1 are set to a specific state on a positioning stage 25 of a wafer loader system 2, the wafer W1 is passed onto a slider arm 24 that is positioned by fixing members 26A-26C. A slider rail 23 is mounted onto a base 21 of the wafer loader system 2 so that it can be rotated freely, the slider arm 24 is moved to a projection aligner 1 along the slider rail 23, the wafer W1 is passed onto a wafer up/down pin 9 from the slider arm 24 being positioned by fixing members 10A-10C, and further the wafer W1 is placed on a wafer holder 8. |
