METHOD AND UNIT FOR EVALUATING SEMICONDUCTOR FILM AND METHOD FOR FORMING SEMICONDUCTOR FILM

摘要

PROBLEM TO BE SOLVED: To manage the process for forming a semiconductor film constantly during the production process by evaluating the crystal grain size of a semiconductor film based on the reflectance of light in a specified wavelength region thereof. SOLUTION: The unit for evaluating a semiconductor film, e.g. a polysilicon (p-Si) film deposited on a glass substrate by excimer laser anneal ELA, being employed in a liquid crystal display comprises an operating section 1, a memory section 2 and a detecting section 3. The detecting section 3 irradiates a substrate 5 to be processed, on which the p-Si is formed, with a detection light and inspects the spectral characteristics of reflected light. The operating section 1 examines the wavelength dependence of reflectance and the minimal value of primary variation rate in the wavelength region of 500 nm or thereabout thus determining the optical value. The optical value has a linear relationship to the p-Si crystal grain size which is determines using information held in a memory section 2. Optimal regulation can be performed constantly by measuring the crystal grain size in-line in the process of ELA, or the like.