| 摘要 |
The invention relates to a traditional, bell-shaped quartz glass component for a reactor chamber of a plasma etching device. This traditional quartz glass component comprises a substrate body made of a first quartz glass quality, and an inner surface facing a reactor interior. This inner surface has an average surface roughness Ra of more than 1 mu m in at least one wrinkle area. The invention seeks to obtain a quartz glass component for a reactor housing which produces, as far as possible, no particles in the reactor chamber; whose interior surface, which faces the reactor interior, demonstrates high adhesion for material coatings deposited thereon; and which is particularly long-lasting. To this end, the wrinkle area consists of a bubble layer deposited on the substrate body and made of a second quartz glass quality with open pores. The invention also relates to a simple method for producing a quartz glass component of this kind, which enables the reproducible setting of a given surface roughness. The method comprises the following steps: a blank is moulded from a SiO2-containing grain mix; the blank is partially or completely vitrified by heating to a temperature over 1000 DEG C; an additional component, which reacts during vitrification on release of a gas, is admixed to the SiO2-containing grain mix in a wrinkle area during moulding of the blank interior surface. As a result of this, a porous bubble layer is produced in the wrinkle area during vitrification. |
