| 发明名称 |
Roller positioning apparatus |
| 摘要 |
A semiconductor processing system, such as a system for scrubbing both sides of a wafer at the same time, that includes a brush box containment apparatus for use with highly-acidic or other volatile chemical solutions, a roller positioning apparatus and a (brush) placement device.
|
| 申请公布号 |
US5809832(A) |
申请公布日期 |
1998.09.22 |
| 申请号 |
US19960705162 |
申请日期 |
1996.08.29 |
| 申请人 |
ONTRAK SYSTEMS, INC. |
发明人 |
GOCKEL, THOMAS R.;OLSON, LORIN;RYLE, LYNN;WHITELAW, BRETT A. |
| 分类号 |
H01L21/00;(IPC1-7):F16H25/20;B25J5/02 |
主分类号 |
H01L21/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
