发明名称 Process for chemical vapor deposition of a liquid raw material
摘要 A chemical vapor deposition process is disclosed comprising the steps of forming liquid droplets of a liquid raw material; injecting the liquid droplets through a plate member opening placed opposite to the surface of the substrate to vaporize the liquid droplets; and supplying a reaction gas that reacts with the vaporized raw material; and depositing a thin film on the substrate.
申请公布号 US5766682(A) 申请公布日期 1998.06.16
申请号 US19950401993 申请日期 1995.03.10
申请人 TSUBOUCHI, KAZUO;MASU, KAZUYA 发明人 TSUBOUCHI, KAZUO;MASU, KAZUYA
分类号 B01D1/14;B01D1/16;B01D1/20;B01D3/06;B01J7/02;C23C16/44;C23C16/448;C23C16/455;C30B25/14;H01L21/285;(IPC1-7):C23C16/00 主分类号 B01D1/14
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