发明名称 |
Process for chemical vapor deposition of a liquid raw material |
摘要 |
A chemical vapor deposition process is disclosed comprising the steps of forming liquid droplets of a liquid raw material; injecting the liquid droplets through a plate member opening placed opposite to the surface of the substrate to vaporize the liquid droplets; and supplying a reaction gas that reacts with the vaporized raw material; and depositing a thin film on the substrate.
|
申请公布号 |
US5766682(A) |
申请公布日期 |
1998.06.16 |
申请号 |
US19950401993 |
申请日期 |
1995.03.10 |
申请人 |
TSUBOUCHI, KAZUO;MASU, KAZUYA |
发明人 |
TSUBOUCHI, KAZUO;MASU, KAZUYA |
分类号 |
B01D1/14;B01D1/16;B01D1/20;B01D3/06;B01J7/02;C23C16/44;C23C16/448;C23C16/455;C30B25/14;H01L21/285;(IPC1-7):C23C16/00 |
主分类号 |
B01D1/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|