发明名称 |
Process for manufacturing devices using maleimide containing resist polymers |
摘要 |
A lithographic process for fabricating a device is disclosed. An area of radiation sensitive material is formed on a substrate. The radiation sensitive material contains a polymeric component The polymeric component is the copolymerization product of a maleimide monomer and at least two other monomers. Acid labile groups are pendant to one of the monomers with which the maleimide monomer is copolymerized. The acid labile groups are pendant to less than 50 mole percent of the monomers that make up the copolymer. The acid labile groups are not pendant to the maleimide monomer. The radiation sensitive material is patternwise exposed to radiation after it is formed on the substrate. The patternwise exposure transfers an image into the radiation sensitive material. The image is developed into a pattern in the radiation sensitive material. The pattern is then transferred into the substrate.
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申请公布号 |
US5756266(A) |
申请公布日期 |
1998.05.26 |
申请号 |
US19960679749 |
申请日期 |
1996.07.15 |
申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
GALVIN-DONOGHUE, MARY ELLEN;REICHMANIS, ELSA |
分类号 |
G03F7/26;G03F7/004;G03F7/039;G03F7/38;H01L21/027;(IPC1-7):G03C5/00 |
主分类号 |
G03F7/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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