| 摘要 |
A control apparatus and method of a semiconductor wafer spin drier are disclosed. In the control apparatus, a cover open/close sensing switch(60) senses whether a cover(125) is opened or closed. A cradle position sensor(70) senses a cradle(124) when cradle(124) is located in a worker's position. A foot switch(80) senses a worker's step when the worker steps cradle(124) to be located. A controller(90) outputs control signals which control cradle(124) to rotate by a force of a motor when a wafer carrier is mounted on cradle(124) and a drier to operated only when all wafer carriers are loaded on cradle(124) according to signals from cover open/close sensing, cradle position, and foot switches(60.70,80). A motor(100) generates a rotary power according to a driving signal of controller(90). A spin drier(120) rotates a rotor(123) by a driving force from motor(100) to dry a wafer.
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