| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive photoresist compsn. having high sensitivity, high heat resistance, high resolution and shelf stability and capable of forming a resist pattern having a superior profile shape on a substrate independently of the kind of the substrate by using a polymer consisting of specified repeating units and having a specified wt. average mol.wt. SOLUTION: This positive photoresist compsn. is based on a polymer consisting of repeating units represented by the formula and having a wt. average mol.wt. of 2,000-1,000,000 (expressed in terms of polystyrene). In the formula, each of R1 -R3 is H or methyl, R4 is H, alkyl or alkoxy, R5 is H, methyl, ethyl, t-butyl, tetrahydropyranyl or alkoxymethylene, (j) is an integer of 1-8, (k) is an integer of 0-8, each of (l), (m) and (n) is a number showing repeating units and l+m+n=1. The polymer may be produced by various polymn. methods but radical polymn. is preferably adopted. |
