发明名称 METHOD FOR MANUFACTURING SUPERCONDUCTING THIN FILM FORMED OF OXIDE SUPERCONDUCTOR HAVING NON SUPERCONDUCTING REGION IN IT, METHOD FOR MANUFACTURING SUPERCONDUCTING DEVICE UTILIZING THE SUPERCONDUCTING THIN FILM AND SUPERCONDUCTING THIN FILM MANUFACTURED THEREBY
摘要 For manufacturing a superconducting thin film having at least one non-superconducting region at and near its surface portion, an oxide superconductor thin film is formed on a surface of the substrate. The oxide superconductor thin film is heated in high vacuum environment so that oxygen of the oxide superconductor crystals escapes from the surface of the oxide superconductor thin film and a surface portion of the oxide superconductor thin film having a substantial thickness changes into non-superconducting layer of a compound oxide which is composed of the same constituent elements as those of the oxide superconductor but includes the oxygen amount less than that of the oxide superconductor and a thin superconducting channel is formed under the non-superconducting layer. A portion of the non-superconducting layer, which will become the non-superconducting region is selectively masked, and heated in an oxidation atmosphere so that oxygen penetrates into the non-superconductor layer from exposed surface and the compound oxide of the exposed portion of the non-superconductor layer changes into the oxide superconductor which is electrically connected to the superconducting channel.
申请公布号 CA2077047(C) 申请公布日期 1998.02.10
申请号 CA19922077047 申请日期 1992.08.27
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 TANAKA, SO;IIYAMA, MICHITOMO
分类号 H01L39/14;H01L39/24;(IPC1-7):H01L39/22 主分类号 H01L39/14
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