RESIN COATING MATERIAL AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To obtain such a resin coating material and a forming method of a resist pattern that reduction of a film can be decreased and a pattern having a square cross section can be obtd. by a simple means when a chemically amplifying resist is used to form a pattern. SOLUTION: A chemically amplifying resist film 2 is formed on an object 1 for etching, and the film is subjected to first heat treatment. Then a resin coating material 7 containing a nonwater soluble resin having a small water content (e.g. a polyolefin polymer) and a basic compd. (e.g. aromatic amine, aliphatic amine and alkylamine) is applied on the chemically amplifying resist film 2. The films are exposed according to a pattern and subjected to second heat treatment. Then the resin coating material film 7 is peeled and the resist film is developed.