发明名称 |
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE AND METHOD FOR DEVELOPING THE PRINTING PLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition suitable for forming a photosensitive layer of a photosensitive lithographic printing plate superior in sensitivity and storage stability and a photosensitive lithographic printing plate developable with an aqueous alkaline solution substantially not containing any solvent. SOLUTION: This photosensitive composition comprises a photopolymerization initiator and a polymerizable compound having an addition-polymerizabule unsaturated bond and a polymer capable of forming a film and the photopolymerization initiator contains a compound represented by the formula in which R<1> is H, an alkyl or the like; R<2> is H, an alkyl; (a) is 0, 1, or 2; X is a halogen; and each of (b) and (c) is an integer of 0-3 and b+c<=5. |
申请公布号 |
JPH09319085(A) |
申请公布日期 |
1997.12.12 |
申请号 |
JP19960157460 |
申请日期 |
1996.05.30 |
申请人 |
KONICA CORP;MITSUBISHI CHEM CORP |
发明人 |
MATSUMURA TOMOYUKI;KIZU NORIYUKI |
分类号 |
G03F7/021;C08F2/50;G03F7/00;G03F7/027;G03F7/028;G03F7/033;G03F7/038;G03F7/30;(IPC1-7):G03F7/028 |
主分类号 |
G03F7/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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