摘要 |
The pattern correction technique includes a step of covering one surface of the substrate (12) including the pattern (20) with a protective film (60) for correction, a step of exposing the one surface of the substrate (12) at a part where a defect (30, 40, 50) exists, a step of filling the part of the exposed one surface of the substrate (12) with a correcting material (70) and a step of removing the protective film (60) for correction. Either one of the protective film (60) for correction and the correcting material (70) consists of a water-soluble material and the other consists of an oil-soluble material. @(19pp Dwg.No.1B,C/2)@. |
申请人 |
KYODO PRINTING CO., LTD., TOKIO/TOKYO, JP |
发明人 |
FURUKAWA, TADAHIRO, BUNKYO-KU TOKYO 112, JP;KIKUCHI, TOSHIAKI, BUNKYO-KU TOKYO 112, JP;KONNO, HITOSHI, BUNKYO-KU TOKYO 112, JP |