CLEANING METHOD OF POLY-SILICON FILM

摘要

cleaning a polysilicon film which is doped with POCl3 using HF solution; cleaning the polysilicon film using HNO3 solution; and cleaning the polysilicon film using HF solution. The method is for preventing the defect, decoloration phenomenon and feeding phenomenon after the formation of a silicide film by performing the cleaning of the polysilicon film using HNO3 solution before forming the silicide film.