| 摘要 |
<p>PROBLEM TO BE SOLVED: To form a photocured pattern efficiently at high sensitivity in a short exposure time and small exposure by using at least one of polyvinyl pyrrolidone and a copolymer of vinylpyrrolidone and vinylimidazole for a water-soluble polymer. SOLUTION: The water-soluble photosensitive resin composition comprises at least more than one of the water-soluble polymer selected from among polyvinyl pyrrolidone and a copolymer of vinylpyrrolidone and vinylimidazole, and as the photosensitive polymer a polymer composition of a specified structural unit is used.</p> |
