发明名称 A fixture and method for laser fabrication by in-situ cleaving of semiconductor bars
摘要 <p>The invention is an apparatus and method for cleaving a semiconductor bar and coating the cleaved facets within a vacuum environment. The apparatus is a fixture (10) having at least one rotator (14,16) for cleaving one or more semiconductor samples (32) into semiconductor bars and positioning the semiconductor bars for immediate coating of their cleaved facets. The fixture (10) is operably positioned within a processing chamber and exposed to a conventional coating medium before, during or immediately after cleaving the semiconductor sample. The fixture (10) cleaves the semiconductor samples (32) in a manner that reduces semiconductor sample waste and also allows the processing environment requirements to be reduced compared to other cleaving and coating techniques. A single actuation feed-through mechanism (70) actuates the fixture from outside of the processing chamber.</p>
申请公布号 EP0771628(A2) 申请公布日期 1997.05.07
申请号 EP19960307639 申请日期 1996.10.22
申请人 AT&T CORP. 发明人 CHAKRABARTI, UTPAL KUMAR;DE JONG, JUDITH FRANCAVILLA;SCHUBERT, ERDMANN FREDERICK;WYNN, JAMES DENNIS;ZYDZIK, GEORGE JOHN
分类号 B28D5/00;H01L21/301;H01L21/304;H01S5/00;H01S5/02;H01S5/40;(IPC1-7):B28D5/00;H01S3/025;H01L33/00 主分类号 B28D5/00
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