发明名称 WAFER SEPARATION APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To simply and securely separate wafers from a wafer laminate one by one by deflecting upward an edge of the uppermost layer wafer of the wafer laminate, and blowing a fluid between the lower surface of the uppermost layer wafer and the upper surface of the adjacent lower side wafer to lift the uppermost layer wafer. SOLUTION: Suction means 22 is actuated to suck a peripheral part of the upper surface of the uppermost layer wafer W and hence to deflect upward a peripheral edge of the uppermost layer wafer W. At this time, even when the uppermost layer wafer W is positioned slantingly, a support plate is mounted on a movable member pivotally so that the uppermost wafer W is sucked following the inclination of the uppermost layer wafer W and is hence further lifted. Furthermore, a fluid is injected from fluid injection means 24 to a gap D formed between the peripheral part of the wafer W and a peripheral part of an adjacent lower side wafer W. Hereby, surface tension between the uppermost layer wafer W and the adjacent lower side wafer W is lowered, and hence they are mutually easily separated.</p>
申请公布号 JPH0964152(A) 申请公布日期 1997.03.07
申请号 JP19950215905 申请日期 1995.08.24
申请人 MIMASU HANDOTAI KOGYO KK 发明人 TSUCHIYA MASATO
分类号 B65G59/04;B28D5/00;B65G49/07;B65H3/08;H01L21/677;(IPC1-7):H01L21/68 主分类号 B65G59/04
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