| 摘要 |
<p>PURPOSE: To remove efficiently a basic gas, in such gases as discharged from a semiconductor manufacturing step, or of ammonia or amines contained in the air due to its leakage from a gas cylinder CONSTITUTION: A gas containing a basic gas is brought into contact with a cleaning agent consisting of copper (II) chloride added to a metal oxide composed mainly of a copper (II) oxide and a manganese (IV) oxide.</p> |
