| 发明名称 |
LIQ. CONTACTING MEMBER |
| 摘要 |
<p>PURPOSE: To provide a liq. contacting member having a high resistance to various chemicals and high mechanical strength, characterized in that the elution of an impurity is quite little and never stains a cleaning liq. or cleaned sample. CONSTITUTION: At least the surface making contact with a liq. is composed of a SiC film formed by the chemical vapor deposition method.</p> |
| 申请公布号 |
JPH08288248(A) |
申请公布日期 |
1996.11.01 |
| 申请号 |
JP19950089502 |
申请日期 |
1995.04.14 |
| 申请人 |
WATANABE SHOKO:KK;HITACHI LTD |
发明人 |
OTAKE MASAHIRO;UMEDA MASARU;TOMIOKA HIDEKI;NITTA TAKEHISA |
| 分类号 |
H01L21/673;H01L21/304;H01L21/68;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/673 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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