发明名称 |
Wear-resistant protective film for thermal head and method of producing the same |
摘要 |
A method of producing a wear-resistant protective film for a thermal head comprises depositing a wear-resistant protective film by sputtering on a thermal head which includes a substrate, and a heat-developing layer and a pair of electrodes formed on either the substrate or a heat-regenerative layer formed thereon. A layer of the wear resistant protective film is formed under a RF larger bias and another layer without a bias or with a smaller bias. Good step coverage is obtained by the RF sputter layer of the wear-resistant and the protective film prevents the intrusion of water that can cause cracking, and the layer formed under no or smaller bias reduces internal stresses and inhibits the development of cracks due to internal stresses as well as the cracking by RF sputtering.
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申请公布号 |
US5557313(A) |
申请公布日期 |
1996.09.17 |
申请号 |
US19930149440 |
申请日期 |
1993.11.09 |
申请人 |
TDK CORPORATION |
发明人 |
NAKAYAMA, MASATOSHI;NAKANO, MASAHIRO;ENDO, TSUKIMI |
分类号 |
B41J2/345;(IPC1-7):B41J2/335 |
主分类号 |
B41J2/345 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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