发明名称 Process for the preparation of partially protected phenolic resins
摘要 <p>A process for the preparation of phenolic resins having acid-labile acetal or ketal protecting groups by reacting a phenolic resin with an enol ether in the presence of an acidic catalyst and subsequently treating the reaction mixture with a basic anion exchanger gives heat-resistant polymers which, in combination with acid photogenerators, produce radiation-sensitive compositions of high processing stability with a greatly improved shelf life.</p>
申请公布号 EP0718315(A1) 申请公布日期 1996.06.26
申请号 EP19950309071 申请日期 1995.12.13
申请人 OCG MICROELECTRONIC MATERIALS, INC. 发明人 MERTESDORF, CARL-LORENZ;NATHAL, BERTOLD;KIRNER, HANS-JORG
分类号 C08F8/00;C08F8/28;C08G8/36;G03F7/004;G03F7/039;H01L21/312;(IPC1-7):C08F8/00;G03F7/00 主分类号 C08F8/00
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