发明名称 |
Process for the preparation of partially protected phenolic resins |
摘要 |
<p>A process for the preparation of phenolic resins having acid-labile acetal or ketal protecting groups by reacting a phenolic resin with an enol ether in the presence of an acidic catalyst and subsequently treating the reaction mixture with a basic anion exchanger gives heat-resistant polymers which, in combination with acid photogenerators, produce radiation-sensitive compositions of high processing stability with a greatly improved shelf life.</p> |
申请公布号 |
EP0718315(A1) |
申请公布日期 |
1996.06.26 |
申请号 |
EP19950309071 |
申请日期 |
1995.12.13 |
申请人 |
OCG MICROELECTRONIC MATERIALS, INC. |
发明人 |
MERTESDORF, CARL-LORENZ;NATHAL, BERTOLD;KIRNER, HANS-JORG |
分类号 |
C08F8/00;C08F8/28;C08G8/36;G03F7/004;G03F7/039;H01L21/312;(IPC1-7):C08F8/00;G03F7/00 |
主分类号 |
C08F8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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