Method for depositing silicon dioxide film and product,申请号EP19900111648-传众专利搜索

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发明名称	Method for depositing silicon dioxide film and product
摘要
申请公布号	EP0404101(B1)	申请公布日期	1996.05.01
申请号	EP19900111648	申请日期	1990.06.20
申请人	WATKINS-JOHNSON COMPANY	发明人	MAHAWILI, IMAD
分类号	C23C16/40;C23C16/42;H01L21/316;(IPC1-7):H01L21/316	主分类号	C23C16/40
代理机构		代理人
主权项
地址

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