发明名称 A multilayered metallurgical structure for an electronic component
摘要 <p>Disclosed is a multilayered metallurgical structure for an electronic component. The structure includes a base metallurgy layer (58) which includes one or more layers of chromium, titanium, zirconium, hafnium, niobium, molybdenum, tantalum, copper and/or aluminum. Directly on the base metallurgy is a layer (60) of cobalt. The structure may also include a layer (62) of noble or relatively noble metal such as gold, platinum, palladium and/or tin directly on the cobalt.</p>
申请公布号 EP0336869(B1) 申请公布日期 1996.01.10
申请号 EP19890480025 申请日期 1989.02.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 AGARWALA, BIRENDRA NATH;BECKHAM, KEITH FOWLER;COOPER-JOSELOW, ALICE HAVEN;NARAYAN, CHANDRASEKHAR;PURUSHOTHAMAN, SAMPATH;RAY, SUDIPTA KUMAR
分类号 H01L21/60;H01L23/498;H01L23/532;H05K3/24;(IPC1-7):H01L23/48;H01L23/52 主分类号 H01L21/60
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