| 摘要 |
PURPOSE:To provide a method for producing a mask for X-ray aligner having high positional accuracy and planarity and in which the positional displacement of pattern due to production process is suppressed. CONSTITUTION:The method for producing a mask for X-ray aligner employs at least an X-ray absorptive pattern, an X-ray transmissive thin film for holding the X-ray absorptive pattern, and a supporting frame for securing the X-ray transmissive thin film on the outer periphery thereof. In order to form an X-ray absorptive pattern finally at a position separated by a distance (r) from the center of the X-ray transmissive thin film, i.e., the mask for X-ray aligner, the X-ray absorptive pattern is formed at such position as previously corrected by an amount corresponding to the displacement of the X-ray absorptive pattern caused by the inner stress of the X-ray transmissive thin film after formation of the supporting frame through etching of a supporting substrate. |
