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发明名称
PROCESS OF PLASMA CHEMICAL REMOVAL OF FILMS OF PHOTORESIST
摘要
申请公布号
RU1653484(C)
申请公布日期
1995.08.20
申请号
SU19894750949
申请日期
1989.10.23
申请人
NAUCHNYJ FIZIKO-TEKHNOLOGICHESKIJ TSENTR
发明人
BUDYANSKIJ A.M.;POKROEV A.G.;EFREMOV A.N.;LEBEDEV E.A.;GOMZHIN I.V.
分类号
H01L21/306;(IPC1-7):H01L21/306
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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