| 摘要 |
PURPOSE:To obtain luminous output with efficiency by forming on a second cladding layer a current constricting layer of a higher refractive index than that of the second cladding layer, and forming electrodes on the underside of the substrate and on the periphery of the luminous screen. CONSTITUTION:A first cladding layer 22, an active layer 23, and a second cladding layer 24, are formed on a substrate 21 in this order. Silicon nitride 27 is formed on the entire surface thereof, and is selectively removed except for its central portion. The second cladding layer 24 is etched halfway using the silicon nitride 27 left in the center as an etching mask. A current constricting layer 28 of a higher refractive index than that of the second cladding layer 24, is formed thereon; however, no current constricting layer 28 is formed on the silicon nitride 27. The silicon nitride 27 is removed by etching, and then a contact layer 29 is formed. Finally, an electrode 26 is formed on the periphery of the contact layer 29 by vapor deposition to make the central portion of the luminous screen a luminous window 30, and further an electrode 25 is also formed on the underside of the substrate 21 by vapor deposition. |
