发明名称 METHOD AND APPARATUS FOR ADJUSTING ELECTRON-BEAM DEVICE
摘要 An electron-beam device comprises an energy analyzer, in which the positions of irradiation and analysis can be brought into agreement with each other easily and precisely. The device comprises an electron lens barrel (401) arranged for deflecting a scanning electron beam ED in the directions X and Y; an energy analyzer (408); and means (416) for displaying an SEM image in a given range on a specimen (407). In this device, the output information obtained from the energy analyzer (408) during the electron-beam scanning is analyzed, and the energy analysis region (504), where electron is taken into the analyzer in a high efficiency, is superimposed on the SEM image. Also, the position (502) irradiated for analysis with an electron beam emitted to the path by means of the electron lens barrel (401) at the moment when in a state equivalent to the non-scanning state is superimposed on the SEM image. The path of the electron beam toward a specimen is deflected so that the region (504) for energy analysis may coincide with the irradiated position (502) on the SEM image.
申请公布号 WO9500835(A1) 申请公布日期 1995.01.05
申请号 WO1994JP00994 申请日期 1994.06.22
申请人 RESEARCH DEVELOPMENT CORPORATION OF JAPAN;TOSOH CORPORATION;TSUKAJIMA, JUNICHI;HAYASHI, TOSHINORI;ENOKIJIMA, TORU 发明人 TSUKAJIMA, JUNICHI;HAYASHI, TOSHINORI;ENOKIJIMA, TORU
分类号 G01N23/00;H01J37/256;(IPC1-7):G01N23/225 主分类号 G01N23/00
代理机构 代理人
主权项
地址