发明名称 Process for producing closely spaced conductive lines for integrated circuits
摘要 A process of fabricating a non-volatile read only memory device (ROM) wherein the conductive word lines have desirable very narrow widths and are closely spaced. The invention provides a process for forming word lines with a smaller width and line pitch than is possible with conventional processes. A first set of word lines is formed. Next, a second set of word lines is formed in between the first word lines using oxide spacers to define the second word lines.
申请公布号 US5378646(A) 申请公布日期 1995.01.03
申请号 US19940271756 申请日期 1994.07.07
申请人 UNITED MICROELECTRONICS CORPORATION 发明人 HUANG, HENG-SHENG;CHEN, KUN-LUH;WU, WOOD
分类号 H01L21/8246;H01L27/112;(IPC1-7):H01L21/265 主分类号 H01L21/8246
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