| 摘要 |
PURPOSE:To provide a method for correcting a mask by which the intensity of light is prevented from being deteriorated caused by the tapered part of the side wall of a transparent film and a projection part or the like is prevented from being formed caused by an error in the superposition of a defective part and the forming area of the transparent film. CONSTITUTION:An engraved part 38 arriving at an electrical conductive layer 32 is formed in an area including the defective part 36 of a phase shifter 34. The bottom surface 40 of the engraved part 38 is smooth and flat. Relative phase difference between the phase angle of the engraved part 38 and the phase angle of the non-defective part 42 of the shifter 34 around the engraved part 38 is set to be within 90 deg.. Then, the phase angle means the relative phase difference of transmitted or passed light with respect to the phase of light made incident on the shifter 34 or the engraved part 38. |
