发明名称 SUBSTRATE FOR FORMATION OF FILM
摘要 <p>PURPOSE:To easily peel a pellicle film from a substrate without scratching or producing wrinkles in the film by coating the surface of the substrate with organopolysiloxane to give releasing property. CONSTITUTION:The surface of a substrate to form films is coated with organopolysiloxane. This organopolysiloxane has excellent releasing property. It is necessary that the substrate to form films has smooth surface and a certain hardness, and thereby, a silicone plate, synthetic quartz plate, and aluminum plate are preferable since these are easily available. The organopolysiloxane to be applied on the substrate is preferably a hardening type one because it has excellent durability. Thus, the substrate coated with organopolysiloxane has releasing property, and thereby, an org. thin film formed on this substrate can be easily peeled without scratching or producing wrinkles.</p>
申请公布号 JPH06175357(A) 申请公布日期 1994.06.24
申请号 JP19920352044 申请日期 1992.12.09
申请人 SHIN ETSU CHEM CO LTD 发明人 KASHIDA SHU;NAGATA AKIHIKO;SHIRASAKI SUSUMU;HAMADA YUICHI;KUBOTA YOSHIHIRO
分类号 B29C41/42;B32B27/00;G03F1/62 主分类号 B29C41/42
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