| 摘要 |
PURPOSE:To obtain an X-ray exposure method wherein a plurality of times position alignment is possible and the position alignment mark region is suppressed. CONSTITUTION:An LFZP 31 which is formed on the mask 1 and serves as a first imaging means for position aliglnment is irradiated with a position alignment light which is a first ray for position alignment, and, at the same time, irradiated with a convergent light converged on a diffraction grating 4 (4a-4c) by the LFZP 31 which grating is formed on a wafer 2 so as to correspond with the LFZP 31. By detecting the light reflected and diffracted from the diffraction grating 4a-4c, the mask 1 and the mask 2 are position-aligned. A mask pattern formed on the mask 1 is exposed on the wafer 2 by using X-ray. In the state that an LFZP 32 which is formed on the mask 1 and serves as a second imaging means for exposure is made to coincide with the diffraction grating 4a-4c formed on the wafer 2, the LFZP 32 is irradiated with an exposure light being a second ray whose wavelength is different from that of the light for position alignment, and the region in the vicinity of the diffraction grating 4 is exposed to the exposure light. |
