首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
PHOTORESIST PROCESSING SOLUTION
摘要
申请公布号
KR930010775(B1)
申请公布日期
1993.11.10
申请号
KR19850007406
申请日期
1985.10.08
申请人
HOECHST JAPAN CO., LTD.;NISSO PETROCHEMICAL IND. CO., LTD.
发明人
ITOH, KUNIO;WATABE, KIMIO;SHIOZAKI, MASAHIRO
分类号
G03F7/32;G03F7/42;(IPC1-7):G03F7/26
主分类号
G03F7/32
代理机构
代理人
主权项
地址
您可能感兴趣的专利
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE, AND ITS MANUFACTURING METHOD
SUBSTRATE PROCESSING DEVICE
COMPOUND SEMICONDUCTOR DEVICE
THERMOELECTRIC MODULE
THERMOELECTRIC CONVERSION MODULE
POLISHING LIQUID FOR METAL
METHOD OF MANUFACTURING LAMINATED STRUCTURAL BODY
HIGH-FREQUENCY HEATING DEVICE
EL DEVICE
SPARK PLUG FOR INTERNAL COMBUSTION ENGINE
CHARGED PARTICLE BEAM SYSTEM AND PATTERN MEASUREMENT METHOD
LONG LAMP CONTAINER
SWITCH DEVICE
MANUFACTURING METHOD OF FLAT PANEL DISPLAY AND TRANSFER FILM
ORGANIC ELECTROLUMINESCENT ELEMENT
FUSE
TERNARY CAM CELL
MAGNETIC HEAD AND MAGNETIC RECORDING DEVICE
SEMICONDUCTOR MEMORY DEVICE
OPTICAL INFORMATION RECORDING AND REPRODUCING DEVICE
