发明名称 Composite semiconductor structure for reducing scattering of carriers by optical phonons and a semiconductor device that uses such a composite semiconductor structure.
摘要 <p>A semiconductor structure comprises a first material layer (11) of a homopolar material having a conduction band that includes an L valley and a GAMMA valley such that the L valley has an energy level (EL) lower than the GAMMA valley (E GAMMA ) when in a bulk crystal state, and a second material layer (12) of a polar compound formed with an epitaxial relationship with respect to the first material layer; wherein the first material layer has a thickness (d11) such that there is formed first and second quantum levels (Q GAMMA , QL) respectively in correspondence to the GAMMA valley and the L valley such that the second quantum level (QL) has an energy level higher than the first quantum level (Q GAMMA ). &lt;IMAGE&gt;</p>
申请公布号 EP0526870(A2) 申请公布日期 1993.02.10
申请号 EP19920113232 申请日期 1992.08.03
申请人 FUJITSU LIMITED 发明人 TSUCHIYA, TAKUMA
分类号 H01L21/20;H01L21/338;H01L29/15;H01L29/812;H01L33/06;H01L33/30;H01L33/34 主分类号 H01L21/20
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