EQUIPMENT FOR PRODUCING TANTALUM OXIDE FILM

摘要

PURPOSE:To provide an equipment for producing tantalum oxide film which controls the actual flow rate of an organic tantalum compound raw material and supplies the stable quantity of the raw material and forms a tantalum oxide film with a high film deposition velocity. CONSTITUTION:After the flow of liquid Ta(OC2H5)5 is directly controlled by a liquid flow controller 8, it is fed to a three-way valve 9 where this liquid, oxygen containing gas 16, and inert gas consisting of Ar flow into each other to blow out Ta(OC2H5)5 in the form of fog, causing it to vaporize, permitting a tantalum oxide film to be deposited on a substrate 3 in a vacuum chamber 1 by thermal decomposition reaction.