| 摘要 |
PURPOSE:To automatically generate exposure data containing a desired alignment pattern only by applying required information. CONSTITUTION:This alignment pattern generator, which fetchs various alignment pattern data corresponding to exposure alignment conditions or mask manufacture conditions from the inside of a prescribed library (a) and transforms the relevant pattern data to graphic data, plural tables (b) is provided with a selecting means (d) selecting a prescribed retrieval index attached to each alignment pattern data in the above-mentioned library, and plural tables grouping and storing the respective retrieval indexes of a group of various pattern data used for the same exposure alignment, and the table according to the above- mentioned conditions, and a data fetching means (c) fetching the pattern data from the inside of the above-mentioned library based on the retrieval index in the said selected table. |
