| 摘要 |
PURPOSE:To offer a practically effective light input device and its production method without using resin by forming a thin film layer consisting of at least two layers formed on a substrate having a hole, forming peripheral structure on the thin film layer and providing at least one layer in the thin film layer with tensile stress. CONSTITUTION:The thin film 11 is formed on the upper surface of a silicone substrate 10. A silicon, substrate having face orientation (1,0,0) is used. An optically transparent thin film having passivation property against an etching solution and tensile stress as its internal stress is used as the thin film 11. Then, a transparent buffer layer 12 having tensile stress as its internal stress, a waveguide layer 13 and a loading layer 14 are formed on the thin film 11. A grating 15 is formed on the surface of the layer 14 by an electron beam plotting method or a photolithographic method. On the other hand, a mask film 16 forming a hole part is formed on the lower face of the substrate 10 and a hole 17 is formed by etching. Since the thin film has passivation property, the etching is ended at a portion arriving at the thin film 11. Thus, input light 18 can be inputted to the waveguide layer 13 through the grating 15 as waveguide light 19 without using resin. |
