| 摘要 |
PURPOSE:To reduce the detection of an artificial defect and to improve the inspection accuracy by setting the size of one picture element optionally when a bit pattern is developed. CONSTITUTION:The light from a light source 1 irradiates a photomask 10 and its transmitted light irradiates the photodetection surface of a photodiode array 2 as a signal detection part; and a sample table 4 is moved continuously and then the array 2 detects and sends a measurement signal corresponding to the inspected pattern of the photomask 10 to a data comparing circuit 3. Design pattern data transferred from a magnetic disk device 13, on the other hand, is processed variously by a computer 6 and sent to a bit pattern generating circuit 7 and data generated by the circuit 7 are sent to the data comparing circuit 3 to decide a defect after processing. In this case, actual coordinate size is defined and the picture element size which is varied according to various conditions is found to generate bit data corresponding to actual image size. Consequently, the detection of the artificial defect is reduced and the inspection accuracy is improved. |
