| 摘要 |
PURPOSE:To provide a radiation-sensitive polymer excellent in dry etching resistance and high in sensitivity and resolution by composing it of a specified polymer. CONSTITUTION:The radiation-sensitive polymer is composed of the polymer having structural units each represented by formula I and optionally having structural units each represented by formula II and in formulae I and II, X is alkyl, halogen, or alkyl halide; R<1> is alkyl, alkoxy, or the like; R<1>' is CO; M is Si, Ge, Sn, or the like; (k) is the valence of M-1; (l) is 0 or a positive integer; Y is same as X; and R<2> is alkyl or aryl, thus permitting a single-layer resist high in sensitivity and resolution, excellent in dry etching resistance and film-forming property, and usable for microfabrication to be ensured. |
