发明名称 MOS semiconductor circuit element - uses voltage control element in upper surface of substrate
摘要 The Insulated Gate Bipolar Transistor (IGBT) with Mos structure, comprises a semi-conductor substrate (2) of a first conductor type, a first region (11) of a second conductor type, and a second region (12) of a first conductor type with higher carrier concentration (the second region is between the first regions). - A single crystalline layer (14) on an isolation layer (13) on the top layer of substrate (2) overlaps regions (11 12). Source and dFj FO0S 1 1 FS.= are formed in the layer (14) with connection to regions (11, 12 resp.). The gate electrode (18) is constructed on isolation layer (17).
申请公布号 DE4039012(A1) 申请公布日期 1991.06.27
申请号 DE19904039012 申请日期 1990.12.06
申请人 FUJI ELECTRIC CO., LTD., KAWASAKI, KANAGAWA, JP 发明人 SAKURAI, KENYA, MATUMOTO, JP
分类号 H01L29/68;H01L27/06;H01L29/739;H01L29/78;H01L29/786 主分类号 H01L29/68
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