发明名称 |
MOS semiconductor circuit element - uses voltage control element in upper surface of substrate |
摘要 |
The Insulated Gate Bipolar Transistor (IGBT) with Mos structure, comprises a semi-conductor substrate (2) of a first conductor type, a first region (11) of a second conductor type, and a second region (12) of a first conductor type with higher carrier concentration (the second region is between the first regions). - A single crystalline layer (14) on an isolation layer (13) on the top layer of substrate (2) overlaps regions (11 12). Source and dFj FO0S 1 1 FS.= are formed in the layer (14) with connection to regions (11, 12 resp.). The gate electrode (18) is constructed on isolation layer (17).
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申请公布号 |
DE4039012(A1) |
申请公布日期 |
1991.06.27 |
申请号 |
DE19904039012 |
申请日期 |
1990.12.06 |
申请人 |
FUJI ELECTRIC CO., LTD., KAWASAKI, KANAGAWA, JP |
发明人 |
SAKURAI, KENYA, MATUMOTO, JP |
分类号 |
H01L29/68;H01L27/06;H01L29/739;H01L29/78;H01L29/786 |
主分类号 |
H01L29/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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